- Model: MA/BA6
- Purpose: the benchmark from semiconductor submicron research to 3D micro-system production.
- Specifications
- UV Lamp power: 350mW
- Expose type: Vac, Low-vac, Hard, Soft, Prox
- Mask size: 5 inch
- Wafer size: 4 inch
- Wavelength: i-line, g-line
- Resolution: <1um(vac), <3um(soft)
반도체 및 생화학 실험기기
2018.03.20 11:31
Mask Aligner
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