• Model: MA/BA6
• Purpose: the benchmark from semiconductor submicron research to 3D micro-system production.
• Specifications
• UV Lamp power: 350mW
• Expose type: Vac, Low-vac, Hard, Soft, Prox
• Mask size: 5 inch
• Wafer size: 4 inch
• Wavelength: i-line, g-line
• Resolution: <1um(vac), <3um(soft)